About this product

Product Identifiers

PublisherWiley & Sons, Incorporated, John

ISBN-100471966819

ISBN-139780471966814

eBay Product ID (ePID)265904

Product Key Features

Book TitleSemiconductor Micromachining, Fundamental Electrochemistry and Physics Vol. 1

Number of Pages332 Pages

LanguageEnglish

Publication Year1998

TopicPhysics / Electricity, Electronics / Semiconductors

IllustratorYes

GenreTechnology & Engineering, Science

AuthorH. -J. Lewerenz

FormatHardcover

Dimensions

Item Height0.9 in

Item Weight22 Oz

Item Length9.3 in

Item Width6.1 in

Additional Product Features

Intended AudienceTrade

LCCN97-026052

Dewey Edition21

Number of Volumes2 vols.

Volume NumberVolume 1

Dewey Decimal621.3815/2

Table Of ContentVolume 1 Electrochemical and Photochemical Properties of Semiconductors S. Morrison Chemical and Electrochemical Etching of Semiconductors J. Kelly and D. Vanmaekelbergh Photoetching of III-V Semiconductors: Basic Photoelectrochemical Principles W. Plieth and S. Wetzenstein Influence of Photoelectrochemical Etching on Electronic Properties of Semiconductor Surfaces R. Tenne Surface Conditioning of Silicon by Photoelectrochemical Etching C. Levy-Clement Electrochemical Conditioning of Silicon: Surface Analyses and Electronic Implications H. Lewerenz and H. Jungblut The Formation of Porous Silicon D. Riley Index

SynopsisSemiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as III?V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 2: Techniques and Industrial Applications, Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as III V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 2: Techniques and Industrial Applications, Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source.

LC Classification NumberTK7871.85.S4295 1997