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Nanofabricatio n Using Focused Ion and Electron Beams: Principles and Application
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eBay item number:354342433352
Item specifics
- Condition
- Book Title
- Nanofabrication Using Focused Ion and Electron Beams: Principles
- ISBN
- 9780199734214
- Publication Name
- Nanofabrication Using Focused Ion and Electron Beams : Principles and Applications
- Item Length
- 7.4in
- Publisher
- Oxford University Press, Incorporated
- Publication Year
- 2012
- Series
- Oxford Series in Nanomanufacturing Ser.
- Type
- Textbook
- Format
- Hardcover
- Language
- English
- Item Height
- 1.9in
- Item Width
- 10.1in
- Item Weight
- 76.3 Oz
- Number of Pages
- 840 Pages
About this product
Product Information
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Product Identifiers
Publisher
Oxford University Press, Incorporated
ISBN-10
0199734216
ISBN-13
9780199734214
eBay Product ID (ePID)
102926968
Product Key Features
Publication Name
Nanofabrication Using Focused Ion and Electron Beams : Principles and Applications
Format
Hardcover
Language
English
Publication Year
2012
Series
Oxford Series in Nanomanufacturing Ser.
Type
Textbook
Number of Pages
840 Pages
Dimensions
Item Length
7.4in
Item Height
1.9in
Item Width
10.1in
Item Weight
76.3 Oz
Additional Product Features
Number of Volumes
1 Vol.
Lc Classification Number
Ta418.9.N35n2525
Reviews
The first part of the book includes eight chapters and occupies roughly one-third of the book, whilst the second part incorporates about 20 chapters and takes up about two-thirds of the book. Such a distribution of material ensures that the basic concepts of these technologies are thoroughly explained ... In a word, one would aver that the volume contains essentially everything one would need to gain a deep understanding of the topics and probably a little morebesides.
Table of Content
Introduction I-1. Historical development of electron beam induced deposition and etching: from carbon to functional materials I. Utke, H. Koops I-2. Historical evolution of FIB technology: from circuit editing to nanoprototyping Ph. Russell. Part I. Fundamentals and Models 1. The theory of bright field electron and field ion emission sources R.Forbes 2. How to select compounds for focused charged particle beam assisted etching and deposition Tristan Bret, Patrik Hoffmann 3. Gas Injection Systems for FEB and FIB Processing: Theory and Experiment Vinzenz Friedli, Heinz D. Wanzenboeck, and Ivo Utke 4. Fundamentals of interactions of electrons with molecules John H. Moore, Petra Swiderek, Stefan Matejcik, Michael Allan 5. Simulation of focused ion beam milling Heung-Bae Kim, Gerhard Hobler 6. FEB and FIB continuum models for one molecule species Ivo Utke 7. Continuum modeling of electron beam induced processes Charlene J. Lobo and Milos Toth 8. Monte Carlo method in EBID process simulations Kazutaka Mitsuishi Part II. Applications Topical Reviews 9. Focused electron beam induced processing (FEBIP) for industrial applications Thorsten Hofmann, Nicole Auth, Klaus Edinger 10. Focused Ion Beam and DualBeam(tm) technology applied to nanoprototyping O. Wilhelmi, J.J.L. Mulders 11. Review of FIB-tomography L. Holzer and M. Cantoni 12. In-situ Monitoring of Gas-Assisted Focused Ion Beam and Focused Electron Beam Induced Processing I. Utke, M. G. Jenke, V. Friedli, J. Michler 13. Cluster Beam Deposition of Metal, Insulator, and Semiconductor Nanoparticles Adam M. Zachary, Igor L. Bolotin, and Luke Hanley Sensor Prototyping 14. Electron- and ion- assisted metal deposition for the fabrication of nanodevices based on individual nanowires Francisco Hernández-Ramírez, Román Jiménez-Díaz, Juan Daniel Prades, Albert Romano-Rodríguez 15. Focused ion beam fabrication of carbon nanotube and ZnO nanodevices Guangyu Chai, Oleg Lupan, and Lee Chow 16. Focused Ion and Electron Beam induced deposition of magnetic nanostructures M.S. Gabureac, L. Bernau, I. Utke, A. Fernandez-Pacheco and J. M. DeTeresa 17. Metal films deposited by FIB and FEB for nanofabrication and nanocontacting purposes A. R. Vaz, S.A. Moshkalev Photonic Device Prototyping (chapter length about 15 pages) 18. FIB Etching for Photonic Device Applications M.J.Cryan, Y-L.D.Ho, P.S.Ivanov, P.J.Heard, J.Rorison and J.G.Rarity 19. Gas assisted FIB etching of InP for rapid-prototyping of photonic crystals Victor Callegari, Urs Sennhauser, and Heinz Jaeckel 20. Applications of FIB for rapid prototyping of photonic devices, fabrication of nano sieve, nanowire and nano antennas V.J.Gadgil 21. Focused particle beam induced deposition of silicon dioxide Heinz D. Wanzenboeck Electrical Characterization 22. Growth and characterization of FEB-deposited suspended nanostructures G. Gazzadi and S. Frabboni 23. Electrical transport properties of metallic nanowires and nanoconstrictions created with FIB J.M. De Teresa, A. Fernández-Pacheco, R. Córdoba, M.R. Ibarra 24. Structure-property relationship in electronic transport on FEBID structures Michael Huth 25. Characterization of nanostructured carbon materials using FIB A. R. Vaz, C. Veríssimo, F.P. Rouxinol, R.V. Gelamo and S. A.Moshkalev Electron Beam Lithography with new materials 26. Electron Beam Controlled Patterning of Molecular Layers: Functional Surfaces and Nanomembranes Armin Goelzhaeuser 27. Nanofabrication using Electron Beam Lithography Processes Antonio Carlos Seabra, Mariana Pojar and Simone Camargo Trippe Prospectives F-1. Focused beam processing - new beam technologies - new challenges in process development and nanofabrication J. Melngailis, S. A. Moshkalev, I. Utke
Copyright Date
2011
Topic
Nanotechnology & Mems, Chemical & Biochemical, Physics / Nuclear
Lccn
2011-028174
Dewey Decimal
620.115
Intended Audience
Scholarly & Professional
Dewey Edition
23
Illustrated
Yes
Genre
Technology & Engineering, Science
Item description from the seller
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eBay item number:354342433352
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Pittsburgh, Pennsylvania, United States
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