Dewey Decimal621.3815/2
Table Of ContentOverview of semiconductor devices; introduction to semiconductor equipment; silicon materials; surface preparation; ion implantation; dopant diffusion; oxidation; silicidation; rapid thermal processing; overview of interconnect; chemical vapour deposition; alternate interlevel dielectrics; polymide dielectrics; physical vapour deposition; chemical-mechanical polish; optical lithography; photoresist materials and processing; x-ray lithography; electron-beam lithography; photomask
SynopsisThe Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit.", The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit. "
LC Classification NumberTK7871.85.H3335 2000